The influence of a layer of oxide on electromigration performance of Al/Cu/Si metal lines /

مواد مشابهة

• Device Characterization of 0.8-µm CMOS Technology
  بواسطة: Kooh, Roy Jinn Chye
  منشور في: (2000)
• Modelling and simulation of hot-carrier degradation in submicrometre MOS transistors /
  بواسطة: Seah, Boon Pian
  منشور في: (1995)
• Analytic methods for timing analysis of interconnects in CMOS very large scale integrated circuits /
  بواسطة: Yong, Alan Kuen Fatt
  منشور في: (1997)
• Development of design framework to overcome aging degradation of 16NM VLSI technology circuits /
  بواسطة: Mahmoud, Mohamed Mounir
  منشور في: (2013)
• Defectivity improvement in advanced processes and its investigation to negative bias temperature instabilities in High-K/Metal-Gate Deep-Submicron CMOS /
  بواسطة: Yasmin Abdul Wahab
  منشور في: (2015)