Plasma process-induced damage to oxide/nitride/oxide (ONO) interpoly dielectric in flash memory devices /

Plasma process-induced damage to oxide/nitride/oxide (ONO) interpoly dielectric in flash memory devices /

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書目詳細資料
主要作者:	Cha, Cher Liang
格式:	Thesis 圖書
語言:	English
出版:	2001.
主題:	Plasma devices > Defects. Ferroelectric storage cells.
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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