Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /

Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /

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書目詳細資料
主要作者:	Shi, Chee Han
格式:	Thesis 圖書
語言:	English
出版:	2008.
主題:	Plasma frequencies. Thin films.
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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