Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /

Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /

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书目详细资料
主要作者:	Shi, Chee Han
格式:	Thesis 图书
语言:	English
出版:	2008.
主题:	Plasma frequencies. Thin films.
标签:	添加标签没有标签, 成为第一个标记此记录!

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